Authors

Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Kim, Young-Chang; Vandervorst, Wilfried; Maex, Karen

Issue

6

Journal

J. Vacuum Science and Technology A

Volume

15

Title

Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas

Publication type

Journal article

Embargo date

9999-12-31