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Using the background signal of a light scattering tool for I/I photo resist strip optimization and monitoring

dc.contributor.authorHalder, Sandip
dc.contributor.authorVos, Rita
dc.contributor.authorWada, Masayuki
dc.contributor.authorClaes, Martine
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorDighe, Prasanna
dc.contributor.authorRadovanovic, Sanda
dc.contributor.authorSimpson, Gavin
dc.contributor.authorSonnemans, Roger
dc.date.accessioned2021-10-18T16:48:57Z
dc.date.available2021-10-18T16:48:57Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17207
dc.sourceIIOimport
dc.titleUsing the background signal of a light scattering tool for I/I photo resist strip optimization and monitoring
dc.typeMeeting abstract
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSimpson, Gavin
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage174
dc.source.endpage175
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate19/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesP3.2


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