dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Demuynck, Steven | |
dc.contributor.author | Ercken, Monique | |
dc.contributor.author | Locorotondo, Sabrina | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Huffman, Craig | |
dc.contributor.author | Brus, Stephan | |
dc.contributor.author | Demand, Marc | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | De Backer, Johan | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Delvaux, Christie | |
dc.contributor.author | Vandeweyer, Tom | |
dc.contributor.author | Baerts, Christina | |
dc.contributor.author | Mannaert, Geert | |
dc.contributor.author | Truffert, Vincent | |
dc.contributor.author | Verluijs, j | |
dc.contributor.author | Alaerts, Wilfried | |
dc.contributor.author | Dekkers, Harold | |
dc.contributor.author | Ong, Patrick | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Kellens, Kristof | |
dc.contributor.author | Volders, Henny | |
dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Vrancken, Christa | |
dc.contributor.author | Rakowski, Michal | |
dc.contributor.author | Verhaegen, Staf | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Absil, Philippe | |
dc.contributor.author | Hoffmann, Thomas Y. | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Biesemans, Serge | |
dc.date.accessioned | 2021-10-18T17:09:11Z | |
dc.date.available | 2021-10-18T17:09:11Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17276 | |
dc.source | IIOimport | |
dc.title | High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Demuynck, Steven | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.imecauthor | Locorotondo, Sabrina | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Brus, Stephan | |
dc.contributor.imecauthor | Demand, Marc | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | De Backer, Johan | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Delvaux, Christie | |
dc.contributor.imecauthor | Vandeweyer, Tom | |
dc.contributor.imecauthor | Baerts, Christina | |
dc.contributor.imecauthor | Mannaert, Geert | |
dc.contributor.imecauthor | Truffert, Vincent | |
dc.contributor.imecauthor | Alaerts, Wilfried | |
dc.contributor.imecauthor | Dekkers, Harold | |
dc.contributor.imecauthor | Ong, Patrick | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Kellens, Kristof | |
dc.contributor.imecauthor | Volders, Henny | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Vrancken, Christa | |
dc.contributor.imecauthor | Rakowski, Michal | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | Absil, Philippe | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | Biesemans, Serge | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.contributor.orcidimec | Truffert, Vincent::0000-0001-7851-830X | |
dc.contributor.orcidimec | Dekkers, Harold::0000-0003-4778-5709 | |
dc.contributor.orcidimec | Ong, Patrick::0000-0002-2072-292X | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.contributor.orcidimec | Altamirano Sanchez, Efrain::0000-0003-3235-6055 | |
dc.contributor.orcidimec | Brus, Stephan::0000-0003-3554-0640 | |
dc.contributor.orcidimec | Struyf, Herbert::0000-0002-6782-5424 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 23 | |
dc.source.endpage | 24 | |
dc.source.conference | IEEE Symposium on VLSI Technology | |
dc.source.conferencedate | 15/06/2010 | |
dc.source.conferencelocation | Honolulu, HI USA | |
imec.availability | Published - imec | |