Authors

Kesters, Els; Lux, Marcel; Pittevils, Joris; Baeyens, Jonas; Vereecke, Guy; Struyf, Herbert

Conference

10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS

Title

Influence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applications

Publication type

Meeting abstract

Embargo date

9999-12-31