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Influence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applications

dc.contributor.authorKesters, Els
dc.contributor.authorLux, Marcel
dc.contributor.authorPittevils, Joris
dc.contributor.authorBaeyens, Jonas
dc.contributor.authorVereecke, Guy
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-18T17:35:37Z
dc.date.available2021-10-18T17:35:37Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17361
dc.sourceIIOimport
dc.titleInfluence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applications
dc.typeMeeting abstract
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage56
dc.source.endpage57
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate20/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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