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Characterization of low-k dielectric etch residue on the sidewall by chemical force microscope

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorSuhard, Samuel
dc.contributor.authorLux, Marcel
dc.contributor.authorVereecke, Guy
dc.contributor.authorClaes, Martine
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-18T17:39:57Z
dc.date.available2021-10-18T17:39:57Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17375
dc.sourceIIOimport
dc.titleCharacterization of low-k dielectric etch residue on the sidewall by chemical force microscope
dc.typeMeeting abstract
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage46
dc.source.endpage47
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate19/10/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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