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Effects of interfacial strength and dimension of structures on physical cleaning window

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorPacco, Antoine
dc.contributor.authorWostyn, Kurt
dc.contributor.authorXu, XiuMei
dc.contributor.authorStruyf, Herbert
dc.contributor.authorArstila, Kai
dc.contributor.authorPark, Jin-Goo
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-18T17:40:20Z
dc.date.available2021-10-18T17:40:20Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17376
dc.sourceIIOimport
dc.titleEffects of interfacial strength and dimension of structures on physical cleaning window
dc.typeMeeting abstract
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage10
dc.source.endpage11
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate19/10/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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