Authors

Klostermann, Ulrich K.; Muelders, Thomas; Schmoeller, Thiomas; Lorusso, Gian; Hendrickx, Eric

Conference

Extreme Ultraviolet (EUV) Lithography

Title

Physical resist models and their calibration: their readiness for accurate EUV lithography simulation

Publication type

Proceedings paper

Embargo date

9999-12-31