Show simple item record

LWR reduction by novel lithographic and etch techniques

dc.contributor.authorKobayashi, Shinji
dc.contributor.authorShimura, Satoru
dc.contributor.authorKawasaki, Tetsu
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorShite, Hideo
dc.contributor.authorNishimura, Eiichi
dc.contributor.authorKushibiki, Masato
dc.contributor.authorHara, Arisa
dc.contributor.authorGronheid, Roel
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorKitano, Junichi
dc.date.accessioned2021-10-18T17:44:58Z
dc.date.available2021-10-18T17:44:58Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17391
dc.sourceIIOimport
dc.titleLWR reduction by novel lithographic and etch techniques
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage763914
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7639


Files in this item

Thumbnail
Name:
20388.pdf
Size:
575.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record