Smoothening of 193 immersion resist by 172 nm VUV exposure

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Authors
Kunnen, Eddy; Vaglio Pret, Alessandro; Luere, Olivier; Azarnouche, Laurent; Pargon, Erwine; Foubert, Philippe; Gronheid, Roel; Shamiryan, Denis; Baklanov, Mikhaïl; Boullart, Werner
Conference
AVS 57th International Symposium & Exhibition
Title
Smoothening of 193 immersion resist by 172 nm VUV exposure
Publication type
Meeting abstract
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