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Smoothening of 193 immersion resist by 172 nm VUV exposure

dc.contributor.authorKunnen, Eddy
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorLuere, Olivier
dc.contributor.authorAzarnouche, Laurent
dc.contributor.authorPargon, Erwine
dc.contributor.authorFoubert, Philippe
dc.contributor.authorGronheid, Roel
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-18T17:51:20Z
dc.date.available2021-10-18T17:51:20Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17410
dc.sourceIIOimport
dc.titleSmoothening of 193 immersion resist by 172 nm VUV exposure
dc.typeMeeting abstract
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conferenceAVS 57th International Symposium & Exhibition
dc.source.conferencedate17/10/2010
dc.source.conferencelocationAlbuquerque, NM USA
imec.availabilityPublished - imec


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