Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning scheme

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Authors
Kunnen, Eddy; Versluijs, Janko; Alaerts, Wilfried; Siew, Yong Kong; Struyf, Herbert; Beyer, Gerald
Conference
3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM
Title
Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning scheme
Publication type
Meeting abstract
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