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Contour-based self-aligning calibration of OPC models

dc.contributor.authorKusnadi, Ir
dc.contributor.authorDo, Thuy
dc.contributor.authorGranik, Yuri
dc.contributor.authorSturtevant, John L.
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHibino, Daisuke
dc.date.accessioned2021-10-18T17:52:41Z
dc.date.available2021-10-18T17:52:41Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17414
dc.sourceIIOimport
dc.titleContour-based self-aligning calibration of OPC models
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76382M
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIV
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7638


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