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Plasma enhanced atomic layer deposition of silicon oxide for through silicon via

dc.contributor.authorKwon, Hak-Yong
dc.contributor.authorKim, Jeon-Ho
dc.contributor.authorKim, Young-Hoon
dc.contributor.authorKim, Young-Jae
dc.contributor.authorKim, Dae-Youn
dc.contributor.authorChoi, Seung-Woo
dc.contributor.authorPark, Hyung-Sang
dc.contributor.authorYoo, Yong-Min
dc.contributor.authorThangaraju, Sarasvathi
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorTravaly, Youssef
dc.contributor.authorSwinnen, Bart
dc.contributor.authorBeynet, Julien
dc.date.accessioned2021-10-18T17:54:19Z
dc.date.available2021-10-18T17:54:19Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17419
dc.sourceIIOimport
dc.titlePlasma enhanced atomic layer deposition of silicon oxide for through silicon via
dc.typeProceedings paper
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorSwinnen, Bart
dc.source.peerreviewno
dc.source.conference10th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate20/06/2010
dc.source.conferencelocationSeoul South Korea
dc.identifier.urlhttp://ald2010.snu.ac.kr/
imec.availabilityPublished - imec


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