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Towards the understanding of resistive contrast imaging in in situ dielectric breakdown studies using a nanoprober setup

dc.contributor.authorLambrinou, Konstantza
dc.contributor.authorHantschel, Thomas
dc.contributor.authorArstila, Kai
dc.contributor.authorKleindiek, Stephan
dc.contributor.authorRummel, Andreas
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorCzarnecki, Piotr
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T17:56:37Z
dc.date.available2021-10-18T17:56:37Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17426
dc.sourceIIOimport
dc.titleTowards the understanding of resistive contrast imaging in in situ dielectric breakdown studies using a nanoprober setup
dc.typeProceedings paper
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorCzarnecki, Piotr
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.source.peerreviewyes
dc.source.beginpage1249-F08-14
dc.source.conferenceAdvanced Interconnects and Chemical Mechanical Planarization for Micro- and Nanoelectronics
dc.source.conferencedate5/04/2010
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 1249


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