Modification of post-etch residues by UV for wet removal

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Authors
Le, Quoc Toan; Drieskens, Frederik; de Marneffe, Jean-Francois; Conard, Thierry; Lux, Marcel; Struyf, Herbert; Vereecke, Guy
Conference
10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
Title
Modification of post-etch residues by UV for wet removal
Publication type
Meeting abstract
Embargo date
9999-12-31
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