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Proximity effects in dry developed lithography for sub-0.35 µm application

dc.contributor.authorGoethals, Mieke
dc.contributor.authorBaik, Ki-Ho
dc.contributor.authorRonse, Kurt
dc.contributor.authorVertommen, Johan
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T12:41:39Z
dc.date.available2021-09-29T12:41:39Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/174
dc.sourceIIOimport
dc.titleProximity effects in dry developed lithography for sub-0.35 µm application
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage394
dc.source.endpage406
dc.source.conferenceAdvances in Resist Technology and Processing XI
dc.source.conferencedate28/02/1994
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.2195


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