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On characterization of etch processes in TCP reactor with PlasmaVolt X2 sensor wafer

dc.contributor.authorMilenin, Alexey
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.contributor.authorArleo, Paul
dc.date.accessioned2021-10-18T19:07:47Z
dc.date.available2021-10-18T19:07:47Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17629
dc.sourceIIOimport
dc.titleOn characterization of etch processes in TCP reactor with PlasmaVolt X2 sensor wafer
dc.typeMeeting abstract
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conference3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate4/03/2010
dc.source.conferencelocationGrenoble France
dc.identifier.urlhttps://imec-events.be/UserFiles/76/File/Presentations/Posters/PESM_2010_poster_Milenin.jpg
imec.availabilityPublished - imec
imec.internalnotesposter presentation


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