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RCA and IMEC/SC2 clean: metallic immunity and gate oxide integrity

dc.contributor.authorChen, Weidong
dc.contributor.authorDhayagude, T.
dc.contributor.authorChaparala, P.
dc.contributor.authorDemirlioglu, E.
dc.contributor.authorShenasa, M.
dc.contributor.authorBearda, Twan
dc.contributor.authorArnauts, Sophia
dc.contributor.authorMeuris, Marc
dc.date.accessioned2021-09-30T07:59:42Z
dc.date.available2021-09-30T07:59:42Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1765
dc.sourceIIOimport
dc.titleRCA and IMEC/SC2 clean: metallic immunity and gate oxide integrity
dc.typeProceedings paper
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage225
dc.source.endpage232
dc.source.conferenceScience and Technology of Semiconductor Surface Preparation
dc.source.conferencedate1/04/1997
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 477


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