dc.contributor.author | Ortolland, Claude | |
dc.contributor.author | Togo, Mitsuhiro | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Mertens, Sofie | |
dc.contributor.author | Kittl, Jorge | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Hoffmann, Thomas Y. | |
dc.date.accessioned | 2021-10-18T19:55:52Z | |
dc.date.available | 2021-10-18T19:55:52Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17748 | |
dc.source | IIOimport | |
dc.title | New carbon-based thermal stability improvement technique for NiPtSi used in CMOS technology | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Mertens, Sofie | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.orcidimec | Mertens, Sofie::0000-0002-1482-6730 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | Materials for Advanced Metallization Conference | |
dc.source.conferencedate | 7/03/2010 | |
dc.source.conferencelocation | Mechelen Belgium | |
imec.availability | Published - open access | |