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Correlation between the Vth-adjustment of nMOSFETs with HfSiO gate oxide and the energy profile of high-k bulk trap density
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Authors
Sahhaf, Sahar
;
Degraeve, Robin
;
Srividya, Vidya
;
Kaczer, Ben
;
Gealy, Dan
;
Horiguchi, Naoto
;
Togo, Mitsuhiro
;
Hoffmann, Thomas Y.
;
Groeseneken, Guido
ISSN
0741-3106
Issue
4
Journal
IEEE Electron Device Letters
Volume
31
Title
Correlation between the Vth-adjustment of nMOSFETs with HfSiO gate oxide and the energy profile of high-k bulk trap density
Publication type
Journal article
Embargo date
9999-12-31
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