dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Opsomer, Karl | |
dc.contributor.author | Rampelberg, Geert | |
dc.contributor.author | Deduytse, Davy | |
dc.contributor.author | Detavernier, Christophe | |
dc.contributor.author | Blasco, Nicolas | |
dc.contributor.author | Zauner, Andy | |
dc.date.accessioned | 2021-10-18T21:20:31Z | |
dc.date.available | 2021-10-18T21:20:31Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17955 | |
dc.source | IIOimport | |
dc.title | ALD of ZrO2, TiO2 and ZrTiO4 thin films from heteroleptic precursors | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.imecauthor | Opsomer, Karl | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.source.peerreview | no | |
dc.source.conference | 10th International Conference on Atomic Layer Deposition - ALD | |
dc.source.conferencedate | 20/06/2010 | |
dc.source.conferencelocation | Seoul Korea | |
imec.availability | Published - imec | |