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ALD of ZrO2, TiO2 and ZrTiO4 thin films from heteroleptic precursors

dc.contributor.authorSchaekers, Marc
dc.contributor.authorOpsomer, Karl
dc.contributor.authorRampelberg, Geert
dc.contributor.authorDeduytse, Davy
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorBlasco, Nicolas
dc.contributor.authorZauner, Andy
dc.date.accessioned2021-10-18T21:20:31Z
dc.date.available2021-10-18T21:20:31Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17955
dc.sourceIIOimport
dc.titleALD of ZrO2, TiO2 and ZrTiO4 thin films from heteroleptic precursors
dc.typeOral presentation
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.conference10th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate20/06/2010
dc.source.conferencelocationSeoul Korea
imec.availabilityPublished - imec


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