Heavily doping technology for strained Ge1-xSnx layers

No Thumbnail [100%x80]
Metadata
Show full item record
Authors
Shimura, Yosuke; Takeuchi, Shotaro; Vincent, Benjamin; Eneman, Geert; Clarysse, Trudo; Vantomme, Andre; Dekoster, Johan; Caymax, Matty; Loo, Roger; Nakatsuka, Osamu; Zaima, Shigeaki
Conference
71st Fall Meeting of the Japan Society of Applied Physics
Title
Heavily doping technology for strained Ge1-xSnx layers
Publication type
Proceedings paper
Collections