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Fabrication of test structures to monitor stress in SU-8 films used for MEMS applications

dc.contributor.authorSmith, S.
dc.contributor.authorBrockie, N. L.
dc.contributor.authorMurray, J.
dc.contributor.authorWilson, Chris
dc.contributor.authorHorsfall, A. B.
dc.contributor.authorTerry, J. G.
dc.contributor.authorStevenson, J. T. M.
dc.contributor.authorMount, A.
dc.contributor.authorWalton, A. J.
dc.date.accessioned2021-10-18T21:43:53Z
dc.date.available2021-10-18T21:43:53Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18006
dc.sourceIIOimport
dc.titleFabrication of test structures to monitor stress in SU-8 films used for MEMS applications
dc.typeProceedings paper
dc.contributor.imecauthorWilson, Chris
dc.source.peerreviewno
dc.source.beginpage8
dc.source.endpage13
dc.source.conferenceIEEE International Conference on Microelectronic Test Structures - ICMTS
dc.source.conferencedate22/03/2010
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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