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Metal hard-mask based double patterning for 22nm and beyond

dc.contributor.authorStruyf, Herbert
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorGoossens, Danny
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorHuffman, Craig
dc.contributor.authorKunnen, Eddy
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorMilenin, Alexey
dc.contributor.authorShamiryan, Denis
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorVandervorst, Alain
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-18T22:02:03Z
dc.date.available2021-10-18T22:02:03Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18046
dc.sourceIIOimport
dc.titleMetal hard-mask based double patterning for 22nm and beyond
dc.typeProceedings paper
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage75
dc.source.endpage82
dc.source.conferenceAdvanced Metallization Conference 2009 - AMC 2009
dc.source.conferencedate13/10/2009
dc.source.conferencelocationBaltimore, MD USA
imec.availabilityPublished - open access


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