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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenis, Karine
dc.contributor.authorBaeyens, Martien
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorWiener, G.
dc.contributor.authorKidd, S. J.
dc.contributor.authorKnotter, D. M.
dc.contributor.authorDe Bokx, P. K.
dc.date.accessioned2021-09-30T08:04:39Z
dc.date.available2021-09-30T08:04:39Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1804
dc.sourceIIOimport
dc.titleSilicon surface metal contamination measurements using grazing-emission XRF spectrometry
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage397
dc.source.endpage402
dc.source.conferenceScience and Technology of Semiconductor Surface Preparation
dc.source.conferencedate1/04/1997
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 477


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