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ESH solvent for stripping positive and negative photoresists in 3D-WLP and 3D-SIC applications

dc.contributor.authorSuhard, Samuel
dc.contributor.authorClaes, Martine
dc.contributor.authorCivale, Yann
dc.contributor.authorNolmans, Philip
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorTravaly, Youssef
dc.date.accessioned2021-10-18T22:05:47Z
dc.date.available2021-10-18T22:05:47Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18054
dc.sourceIIOimport
dc.titleESH solvent for stripping positive and negative photoresists in 3D-WLP and 3D-SIC applications
dc.typeMeeting abstract
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorNolmans, Philip
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage58
dc.source.endpage59
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate19/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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