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Plasma enhanced atomic layer deposition of ruthenium ultra-thin films for advanced metallization

dc.contributor.authorSwerts, Johan
dc.contributor.authorArmini, Silvia
dc.contributor.authorCarbonell, Laure
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFranquet, Alexis
dc.contributor.authorMertens, Sofie
dc.contributor.authorSchaekers, Marc
dc.contributor.authorWitters, Thomas
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorGravey, Virginie
dc.contributor.authorCockburn, Andrew
dc.contributor.authorShah, Kavita
dc.contributor.authorAubuchon, Joseph
dc.date.accessioned2021-10-18T22:07:11Z
dc.date.available2021-10-18T22:07:11Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18057
dc.sourceIIOimport
dc.titlePlasma enhanced atomic layer deposition of ruthenium ultra-thin films for advanced metallization
dc.typeMeeting abstract
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.conferenceAVS 57th International Symposium & Exhibition
dc.source.conferencedate17/10/2010
dc.source.conferencelocationAlbuquerque, NM USA
imec.availabilityPublished - imec


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