Publication:
Modeling the influence of gas composition in an Ar/Cl2/O2 inductively coupled plasma used for STI etching
Date
Loading...
Journal
Abstract
Description
Metrics
Views
1904 since deposited on 2021-10-18
Acq. date: 2026-01-09
Citations
Metrics
Views
1904 since deposited on 2021-10-18
Acq. date: 2026-01-09
Citations