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Modeling the influence of gas composition in an Ar/Cl2/O2 inductively coupled plasma used for STI etching

dc.contributor.authorTinck, Stefan
dc.contributor.authorBogaerts, Annemie
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-18T22:21:24Z
dc.date.available2021-10-18T22:21:24Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18088
dc.sourceIIOimport
dc.titleModeling the influence of gas composition in an Ar/Cl2/O2 inductively coupled plasma used for STI etching
dc.typeMeeting abstract
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conference3rd workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate4/03/2010
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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