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Solvent-based strip of high dose ion implanted photoresist

dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorPohland, Maximilian
dc.contributor.authorVanstreels, Kris
dc.contributor.authorFranquet, Alexis
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-18T22:30:30Z
dc.date.available2021-10-18T22:30:30Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18107
dc.sourceIIOimport
dc.titleSolvent-based strip of high dose ion implanted photoresist
dc.typeMeeting abstract
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewyes
dc.source.conference3rd International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate4/03/2010
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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