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Non-oxidizing solvent-based strip of ion implanted photoresist

dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorVanstreels, Kris
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.contributor.authorWaldfried, Carlo
dc.contributor.authorMattson, David
dc.contributor.authorDeLuca, J
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorParac-Vogt, Tatjana
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-18T22:31:01Z
dc.date.available2021-10-18T22:31:01Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18108
dc.sourceIIOimport
dc.titleNon-oxidizing solvent-based strip of ion implanted photoresist
dc.typeMeeting abstract
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces
dc.source.conferencedate20/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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