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Determination of the oxygen content in platelike and octahedral oxygen precipitates in silicon with FT-IR spectroscopy

dc.contributor.authorDe Gryse, O.
dc.contributor.authorClauws, P.
dc.contributor.authorVanhellemont, Jan
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-09-30T08:05:57Z
dc.date.available2021-09-30T08:05:57Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1813
dc.sourceIIOimport
dc.titleDetermination of the oxygen content in platelike and octahedral oxygen precipitates in silicon with FT-IR spectroscopy
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage405
dc.source.endpage410
dc.source.conferenceDefects in Semiconductors 19 - ICDS 19
dc.source.conferencedate21/07/1997
dc.source.conferencelocationAveiro Portugal
imec.availabilityPublished - open access
imec.internalnotesMaterials Science Forum; Vols. 258-263


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