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Understanding the impact of metal gate on TANOS performance and retention

dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorArreghini, Antonio
dc.contributor.authorBreuil, Laurent
dc.contributor.authorCacciato, Antonio
dc.contributor.authorSchram, Tom
dc.contributor.authorSuhane, Amit
dc.contributor.authorZahid, Mohammed
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-18T22:52:45Z
dc.date.available2021-10-18T22:52:45Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18157
dc.sourceIIOimport
dc.titleUnderstanding the impact of metal gate on TANOS performance and retention
dc.typeProceedings paper
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorArreghini, Antonio
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecArreghini, Antonio::0000-0002-7493-9681
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewyes
dc.source.beginpage110
dc.source.endpage113
dc.source.conferenceIEEE International Memory Workshop - IMW
dc.source.conferencedate16/05/2010
dc.source.conferencelocationSeoul Korea
imec.availabilityPublished - imec


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