dc.contributor.author | Van Den Heuvel, Dieter | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Magana, John | |
dc.contributor.author | Abe, Tsukasa | |
dc.contributor.author | Bret, Tristan | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Cheng, Shaunee | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-10-18T22:54:13Z | |
dc.date.available | 2021-10-18T22:54:13Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18160 | |
dc.source | IIOimport | |
dc.title | Natural EUV mask blank defects: evidence, timely detection, analysis and outlook | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 78231T | |
dc.source.conference | Photomask Technology 2010 | |
dc.source.conferencedate | 13/09/2010 | |
dc.source.conferencelocation | Monterey, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings SPIE, Vol. 7823 | |