dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Popovici, Mihaela Ioana | |
dc.contributor.author | Swerts, Johan | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Nyns, Laura | |
dc.contributor.author | Shi, Xiaoping | |
dc.contributor.author | Tielens, Hilde | |
dc.contributor.author | Brijs, Bert | |
dc.contributor.author | Pourtois, Geoffrey | |
dc.contributor.author | Schram, Tom | |
dc.contributor.author | Pierreux, Dieter | |
dc.contributor.author | Maes, Jan | |
dc.contributor.author | Hardy, An | |
dc.contributor.author | Van Bael, Marlies | |
dc.contributor.author | Kittl, Jorge | |
dc.date.accessioned | 2021-10-18T23:01:07Z | |
dc.date.available | 2021-10-18T23:01:07Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18174 | |
dc.source | IIOimport | |
dc.title | Rare earth materials for semiconductor applications | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Popovici, Mihaela Ioana | |
dc.contributor.imecauthor | Swerts, Johan | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Nyns, Laura | |
dc.contributor.imecauthor | Tielens, Hilde | |
dc.contributor.imecauthor | Pourtois, Geoffrey | |
dc.contributor.imecauthor | Schram, Tom | |
dc.contributor.imecauthor | Pierreux, Dieter | |
dc.contributor.imecauthor | Maes, Jan | |
dc.contributor.imecauthor | Hardy, An | |
dc.contributor.imecauthor | Van Bael, Marlies | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Nyns, Laura::0000-0001-8220-870X | |
dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
dc.contributor.orcidimec | Van Bael, Marlies::0000-0002-5516-7962 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 155 | |
dc.source.endpage | 164 | |
dc.source.conference | Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment | |
dc.source.conferencedate | 25/04/2010 | |
dc.source.conferencelocation | Vancouver Canada | |
dc.identifier.url | ECS Transaction, vol.28, no.1 - ISBN 978-1-56677-791-9 | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 28, Issue 1 | |