dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Popovici, Mihaela Ioana | |
dc.contributor.author | Swerts, Johan | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Nyns, Laura | |
dc.contributor.author | Shi, Xiaoping | |
dc.contributor.author | Tielens, Hilde | |
dc.contributor.author | Pourtois, Geoffrey | |
dc.contributor.author | Menou, Nicolas | |
dc.contributor.author | Breuil, Laurent | |
dc.contributor.author | Pierreux, Dieter | |
dc.contributor.author | Maes, Jan | |
dc.contributor.author | Hardy, An | |
dc.contributor.author | Van Bael, Marlies | |
dc.contributor.author | Jurczak, Gosia | |
dc.contributor.author | Kittl, Jorge | |
dc.date.accessioned | 2021-10-18T23:01:46Z | |
dc.date.available | 2021-10-18T23:01:46Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18175 | |
dc.source | IIOimport | |
dc.title | On the process and material sensitivities for high-k based dielectrics | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Popovici, Mihaela Ioana | |
dc.contributor.imecauthor | Swerts, Johan | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Nyns, Laura | |
dc.contributor.imecauthor | Tielens, Hilde | |
dc.contributor.imecauthor | Pourtois, Geoffrey | |
dc.contributor.imecauthor | Breuil, Laurent | |
dc.contributor.imecauthor | Pierreux, Dieter | |
dc.contributor.imecauthor | Maes, Jan | |
dc.contributor.imecauthor | Hardy, An | |
dc.contributor.imecauthor | Van Bael, Marlies | |
dc.contributor.imecauthor | Jurczak, Gosia | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Nyns, Laura::0000-0001-8220-870X | |
dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
dc.contributor.orcidimec | Breuil, Laurent::0000-0003-2869-1651 | |
dc.contributor.orcidimec | Van Bael, Marlies::0000-0002-5516-7962 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 693 | |
dc.source.endpage | 698 | |
dc.source.conference | China Semiconductor Technology International Conference - CSTIC | |
dc.source.conferencedate | 18/03/2010 | |
dc.source.conferencelocation | Shanghai China | |
dc.identifier.url | http://semiconchina.semi.org/scchina-en/ProgramsEvents/CTR_012200 | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 27, Issue 1 | |