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Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography

dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRichter, Jan
dc.contributor.authorBubke, Karsten
dc.contributor.authorPeters, Jan Hendrik
dc.contributor.authorSchreel, Koen
dc.contributor.authorDusa, Mircea
dc.date.accessioned2021-10-18T23:09:56Z
dc.date.available2021-10-18T23:09:56Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18193
dc.sourceIIOimport
dc.titleExperimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76401Y
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7640


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