Show simple item record

Cleaning and surface preparation for SiGe and Ge channel device

dc.contributor.authorWada, M
dc.contributor.authorTakahashi, H
dc.contributor.authorSnow, J
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorShirakawa, H
dc.date.accessioned2021-10-19T00:10:56Z
dc.date.available2021-10-19T00:10:56Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18320
dc.sourceIIOimport
dc.titleCleaning and surface preparation for SiGe and Ge channel device
dc.typeMeeting abstract
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.beginpage7.3
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate20/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record