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Multiple patterning: step by step towards 1X nm hp

dc.contributor.authorWiaux, Vincent
dc.contributor.authorWong, Patrick
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVersluijs, Janko
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-19T00:25:55Z
dc.date.available2021-10-19T00:25:55Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18350
dc.sourceIIOimport
dc.titleMultiple patterning: step by step towards 1X nm hp
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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