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Application of model-based library approach to photoresist pattern shape measurement in advenced lithography

dc.contributor.authorYasui, Naoki
dc.contributor.authorIsawa, Miki
dc.contributor.authorIshimoto, Toru
dc.contributor.authorSekiguchi, Kohei
dc.contributor.authorTanaka, Maki
dc.contributor.authorOsaki, Mayuka
dc.contributor.authorShishido, Chie
dc.contributor.authorHasegawa, Norio
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-19T00:42:51Z
dc.date.available2021-10-19T00:42:51Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18383
dc.sourceIIOimport
dc.titleApplication of model-based library approach to photoresist pattern shape measurement in advenced lithography
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76382O
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIV
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7638


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