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Ultra low-k materials: challenges of scaling

dc.contributor.authorZhao, Larry
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-19T01:02:15Z
dc.date.available2021-10-19T01:02:15Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18422
dc.sourceIIOimport
dc.titleUltra low-k materials: challenges of scaling
dc.typeMeeting abstract
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1683
dc.source.conference218th ECS meeting, Symposium E9: Processing, Materials, and Integration of Damscene and 3D Interconnects
dc.source.conferencedate10/10/2010
dc.source.conferencelocationLas Vegas, NV USA
imec.availabilityPublished - open access
imec.internalnotesECS Meeting Abstracts; Vol. 2010-02


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