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Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch

dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorDemand, Marc
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-19T12:28:55Z
dc.date.available2021-10-19T12:28:55Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18471
dc.sourceIIOimport
dc.titlePlasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch
dc.typeOral presentation
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conferenceAVS 58th International Symposium and Exhibition
dc.source.conferencedate30/10/2011
dc.source.conferencelocationNashville, TN USA
imec.availabilityPublished - imec
imec.internalnotesPS+SE-MoA4


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