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Non-destructive characterization of activated ion-implanted doping profiles based on photomodulated optical reflectance

dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorClarysse, Trudo
dc.contributor.authorMoussa, Alain
dc.contributor.authorMody, Jay
dc.contributor.authorEyben, Pierre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorRosseel, Erik
dc.date.accessioned2021-10-19T12:37:20Z
dc.date.available2021-10-19T12:37:20Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18597
dc.sourceIIOimport
dc.titleNon-destructive characterization of activated ion-implanted doping profiles based on photomodulated optical reflectance
dc.typeProceedings paper
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorRosseel, Erik
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.source.peerreviewno
dc.source.beginpage220
dc.source.endpage224
dc.source.conferenceIon Implantation Technology 2010. 18th International Conference
dc.source.conferencedate6/06/2010
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - imec
imec.internalnotesAIP Conference Proceedings; Vol. 1321


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