dc.contributor.author | Brammertz, Guy | |
dc.contributor.author | Alian, AliReza | |
dc.contributor.author | Lin, Dennis | |
dc.contributor.author | Nyns, Laura | |
dc.contributor.author | Sioncke, Sonja | |
dc.contributor.author | Merckling, Clement | |
dc.contributor.author | Wang, Wei-E | |
dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Hoffmann, Thomas Y. | |
dc.date.accessioned | 2021-10-19T12:39:53Z | |
dc.date.available | 2021-10-19T12:39:53Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18621 | |
dc.source | IIOimport | |
dc.title | Electrical quality of III-V/oxide interfaces: good enough for MOSFET devices? | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Brammertz, Guy | |
dc.contributor.imecauthor | Alian, AliReza | |
dc.contributor.imecauthor | Lin, Dennis | |
dc.contributor.imecauthor | Nyns, Laura | |
dc.contributor.imecauthor | Merckling, Clement | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.orcidimec | Brammertz, Guy::0000-0003-1404-7339 | |
dc.contributor.orcidimec | Nyns, Laura::0000-0001-8220-870X | |
dc.contributor.orcidimec | Merckling, Clement::0000-0003-3084-2543 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1017 | |
dc.source.endpage | 1022 | |
dc.source.conference | China Semiconductor Technology International Conference - CSTIC | |
dc.source.conferencedate | 13/03/2011 | |
dc.source.conferencelocation | Shanghai China | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 34, Issue 1 | |