dc.contributor.author | Bret, Tristan | |
dc.contributor.author | Baralia, Gabriel | |
dc.contributor.author | Baur, Christof | |
dc.contributor.author | Budach, Michael | |
dc.contributor.author | Hofmann, Thorsten | |
dc.contributor.author | Edinger, Klaus | |
dc.contributor.author | Magana, John | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Van Den Heuvel, Dieter | |
dc.date.accessioned | 2021-10-19T12:40:08Z | |
dc.date.available | 2021-10-19T12:40:08Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18623 | |
dc.source | IIOimport | |
dc.title | EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | 55th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBN | |
dc.source.conferencedate | 31/05/2011 | |
dc.source.conferencelocation | Las Vegas, NV USA | |
imec.availability | Published - open access | |