dc.contributor.author | Chen, Yangyin | |
dc.contributor.author | Goux, Ludovic | |
dc.contributor.author | Pantisano, Luigi | |
dc.contributor.author | Swerts, Johan | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Mertens, Sofie | |
dc.contributor.author | Afanasiev, Valeri | |
dc.contributor.author | Wang, Xin Peng | |
dc.contributor.author | Govoreanu, Bogdan | |
dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Kubicek, Stefan | |
dc.contributor.author | Paraschiv, Vasile | |
dc.contributor.author | Verbrugge, Beatrijs | |
dc.contributor.author | Jossart, Nico | |
dc.contributor.author | Altimime, Laith | |
dc.contributor.author | Jurczak, Gosia | |
dc.contributor.author | Kittl, Jorge | |
dc.contributor.author | Groeseneken, Guido | |
dc.contributor.author | Wouters, Dirk | |
dc.date.accessioned | 2021-10-19T12:45:41Z | |
dc.date.available | 2021-10-19T12:45:41Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18666 | |
dc.source | IIOimport | |
dc.title | Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized Plasma Enhanced Atomic Layer Deposition (PEALD) process for TiN electrode | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Chen, Yangyin | |
dc.contributor.imecauthor | Goux, Ludovic | |
dc.contributor.imecauthor | Swerts, Johan | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Mertens, Sofie | |
dc.contributor.imecauthor | Afanasiev, Valeri | |
dc.contributor.imecauthor | Govoreanu, Bogdan | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Kubicek, Stefan | |
dc.contributor.imecauthor | Paraschiv, Vasile | |
dc.contributor.imecauthor | Jossart, Nico | |
dc.contributor.imecauthor | Jurczak, Gosia | |
dc.contributor.imecauthor | Groeseneken, Guido | |
dc.contributor.orcidimec | Goux, Ludovic::0000-0002-1276-2278 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Mertens, Sofie::0000-0002-1482-6730 | |
dc.contributor.orcidimec | Afanasiev, Valeri::0000-0001-5018-4539 | |
dc.contributor.orcidimec | Govoreanu, Bogdan::0000-0001-7210-2979 | |
dc.contributor.orcidimec | Groeseneken, Guido::0000-0003-3763-2098 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 7.3 | |
dc.source.conference | IEEE International Interconnect Technology Conference and Materials for Advanced Metallization - IITC/MAM | |
dc.source.conferencedate | 8/05/2011 | |
dc.source.conferencelocation | Dresden Germany | |
imec.availability | Published - imec | |