Authors

de Marneffe, Jean-Francois; Lazzarino, Frederic; Goossens, Danny; Vandervorst, Alain; Richard, Olivier; Shamiryan, Denis; Xu, Kaidong; Truffert, Vincent; Boullart, Werner

ISSN

0021-4922

Issue

8

Journal

Japanese Journal of Applied Physics

Volume

50

Title

Patterning of 25nm contact holes at 90nm pitch: combination of line/space double exposure immersion lithography and plasma-assisted shrink technology

Publication type

Journal article