Show simple item record

Impact of substrate rotation and temperature on the mobility and series resistance of triple-gate SOI nMOSFETs

dc.contributor.authorde Souza, M.
dc.contributor.authorPavanello, M.A.
dc.contributor.authorMartino, J.A.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-19T13:07:31Z
dc.date.available2021-10-19T13:07:31Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18799
dc.sourceIIOimport
dc.titleImpact of substrate rotation and temperature on the mobility and series resistance of triple-gate SOI nMOSFETs
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewno
dc.source.beginpage223
dc.source.endpage230
dc.source.conference26th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate30/08/2011
dc.source.conferencelocationJoao Pessoa Brazil
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 39, Issue 1


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record