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Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations

dc.contributor.authorFinders, Jo
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorTzviatkov, Plamen
dc.date.accessioned2021-09-30T08:16:49Z
dc.date.available2021-09-30T08:16:49Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1882
dc.sourceIIOimport
dc.titleImpact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage17
dc.source.endpage30
dc.source.conferenceProceedings Interface '97 Microlithography Symposium
dc.source.conferencelocation
imec.availabilityPublished - imec


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